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- Inkjet priting technique – selective deposition of conductors (Ag nanoparticle, PEDOT:PSS based inks), dielectrics (SU8, PVP based inks), semiconductors (ZnO, PANI based inks) and seed layers (eg. diamond and ZnO)
- Spin coating
- Evaporation
- High energy pulsed light curing, sintering or annealing – delivering up to 2500 J/pulse, radiant pulse energy up to 7 J.cm-2, pulse range from 100 to 6000 μs
- UV ozone cleaning – up to 150 °C
- High temperature annealing
- Doctor blade applicator
- Direct-write optical lithography
- Atomic Layer Deposition
- Deep Reactive Ion Etching