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  • Inkjet priting technique – selective deposition of conductors (Ag nanoparticle, PEDOT:PSS based inks), dielectrics (SU8, PVP based inks), semiconductors (ZnO, PANI based inks) and seed layers (eg. diamond and ZnO)
  • Spin coating
  • Evaporation
  • High energy pulsed light curing, sintering or annealing – delivering up to 2500 J/pulse, radiant pulse energy up to 7 J.cm-2, pulse range from 100 to 6000 μs
  • UV ozone cleaning – up to 150 °C
  • High temperature annealing
  • Doctor blade applicator
  • Direct-write optical lithographyready for use during 2020
  • Atomic Layer Deposition – ready for use during 2020
  • Deep Reactive Ion Etchingready for use during 2020